Comparative study of Cu and CuAl0.3 wt.% films

Microelectronic Engineering 2001 Vol. 55; Iss. 1-4

Comparative study of Cu and CuAl0.3 wt.% films

G Schwalbe, J Baumann, C Kaufmann, T Gessner, H Koenigsmann, A Bartzsch, P Gilman
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Volume:
55
Year:
2001
Language:
english
Pages:
8
DOI:
10.1016/s0167-9317(00)00466-4
File:
PDF, 528 KB
english, 2001
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