Effect of rapid thermal process on oxygen precipitation and...

Microelectronic Engineering 2003 Vol. 69; Iss. 1

Effect of rapid thermal process on oxygen precipitation and denuded zone in nitrogen-doped silicon wafers

Xuegong Yu, Deren Yang, Xiangyang Ma, Duanlin Que
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Volume:
69
Year:
2003
Language:
english
Pages:
8
DOI:
10.1016/s0167-9317(03)00276-4
File:
PDF, 321 KB
english, 2003
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