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Challenges of back end of the line for sub 65 nm generation
M. Fayolle, G. Passemard, O. Louveau, F. Fusalba, J. CluzelVolume:
70
Year:
2003
Language:
english
Pages:
12
DOI:
10.1016/s0167-9317(03)00467-2
File:
PDF, 1.59 MB
english, 2003