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Cu-CVD process optimised in a cluster equipment for IC manufacturing
C. Marcadal, E. Richard, J.L. Mermet, J. Torres, J. Palleau, B. Alaux, M. BakliVolume:
33
Year:
1997
Language:
english
Pages:
11
DOI:
10.1016/s0167-9317(96)00025-1
File:
PDF, 495 KB
english, 1997