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Selective metallization of silica surfaces by copper CVD using a chemical affinity pattern created by gas phase silylation and UV exposure
Pascal Doppelt, Martin StelzleVolume:
33
Year:
1997
Language:
english
Pages:
9
DOI:
10.1016/s0167-9317(96)00026-3
File:
PDF, 479 KB
english, 1997