Halogen based copper RIE—influence of the material...

Microelectronic Engineering 1997 Vol. 33; Iss. 1-4

Halogen based copper RIE—influence of the material characteristics and deposition processes

Andreas Bertz, Matthias Markert, Thomas Gessner
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Volume:
33
Year:
1997
Language:
english
Pages:
7
DOI:
10.1016/s0167-9317(96)00046-9
File:
PDF, 618 KB
english, 1997
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