Evaluation of SiO2 aerogel thin film with ultra low...

Microelectronic Engineering 1997 Vol. 33; Iss. 1-4

Evaluation of SiO2 aerogel thin film with ultra low dielectric constant as an intermetal dielectric

Moon-Ho Jo, Jung-Kyun Hong, Hyung-Ho Park, Joong-Jung Kim, Sang-Hun Hyun
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Volume:
33
Year:
1997
Language:
english
Pages:
6
DOI:
10.1016/s0167-9317(96)00063-9
File:
PDF, 316 KB
english, 1997
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