Imprint lithography with sub-10 nm feature size and high...

Microelectronic Engineering 1997 Vol. 35; Iss. 1-4

Imprint lithography with sub-10 nm feature size and high throughput

Stephen Y. Chou, Peter R. Krauss
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Volume:
35
Year:
1997
Language:
english
Pages:
4
DOI:
10.1016/s0167-9317(96)00097-4
File:
PDF, 301 KB
english, 1997
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