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Volume 35; Issue 1-4
Main
Microelectronic Engineering
Volume 35; Issue 1-4
Microelectronic Engineering
Volume 35; Issue 1-4
1
The present position and future status of electron beam lithography for VLSI fabrication
T. Matsuzaka
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 386 KB
Your tags:
english, 1997
2
Nanolithography with NOVER (Negative Organic Vacuum E-beam Resist)
V. Petrashov
,
Ju.T. Abramenko
,
Ju.I. Koval
,
L. Aparshina
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 209 KB
Your tags:
english, 1997
3
DUV resist etch selectivity improvements using UV stabilization
W.L. Krisa
,
S.Y. Shaw
,
S. Slater
,
L. Insalaco
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 299 KB
Your tags:
english, 1997
4
Low energy electron beam lithography: Pattern distortion by charge trapped in the resist
V.A. Kudryashov
,
V.V. Krasnov
,
P.D. Prewett
,
T.J. Hall
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 296 KB
Your tags:
english, 1997
5
High resolution electron beam lithography studies on Shipley chemically amplified DUV resists
D. Macintyre
,
S. Thoms
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 271 KB
Your tags:
english, 1997
6
Hot electron interference by 40 nm-pitch double slit buried in semiconductor
H. Hongo
,
Y. Miyamoto
,
M. Suhara
,
K. Furuya
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 317 KB
Your tags:
english, 1997
7
Optimization of optical density and planarization of an anti-reflectant
EK Pavelchek
,
M DoCanto
,
TG Adams
,
TL Murnane
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 318 KB
Your tags:
english, 1997
8
The formation of acid diffusion wells in acid catalyzed photoresists
John S. Petersen
,
Jeffrey D. Byers
,
Ronald A. Carpio
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 459 KB
Your tags:
english, 1997
9
Bottom Anti-Reflective Coatings for DUV lithography: Determination of optimum thermal process conditions
A. Schiltz
,
J-F. Terpan
,
G. Amblard
,
P.J. Paniez
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 299 KB
Your tags:
english, 1997
10
Submicrometer p-type SiGe modulation-doped field-effect transistors for high speed applications
I. Adesida
,
M. Arafa
,
K. Ismail
,
J.O. Chu
,
B.S. Meyerson
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 319 KB
Your tags:
english, 1997
11
200nm Deep-UV lithography using Step-and-Scan
Harry Sewell
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 487 KB
Your tags:
english, 1997
12
Anisotropic etching of inverted pyramids in the sub-100 nm region
T. Hantschel
,
W. Vandervorst
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 214 KB
Your tags:
english, 1997
13
A new alignment technique for steppers: Hybrid marks®
L. Auzino
,
A. Cangiano
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 307 KB
Your tags:
english, 1997
14
Simultaneous exposure of filter gratings and waveguides by direct write electron-beam lithography
R. Steingrüber
,
M. Hamacher
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 347 KB
Your tags:
english, 1997
15
Room temperature operated single electron transistor fabricated by electron beam nanolithography
K. Kurihara
,
H. Namatsu
,
M. Nagase
,
T. Makino
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 305 KB
Your tags:
english, 1997
16
Resist profile enhancement in near field holographic printing using bottom anti-reflection coatings
R.G. Ahrens
,
D.M. Tennant
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 536 KB
Your tags:
english, 1997
17
Development behaviour of irradiated microstructures
J. Zanghellini
,
A. El-Kholi
,
J. Mohr
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 337 KB
Your tags:
english, 1997
18
A novel method of optical proximity correction using anti-reflective layers and individual photoresist characteristics
G. Arthur
,
B. Martin
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 281 KB
Your tags:
english, 1997
19
Imprint lithography with sub-10 nm feature size and high throughput
Stephen Y. Chou
,
Peter R. Krauss
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 301 KB
Your tags:
english, 1997
20
Surface modifications of YBa2Cu3O7-δ thin films usinga STM in air and in UHV
G. Bertsche
,
W. Clauss
,
D.P. Kern
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 263 KB
Your tags:
english, 1997
21
Quantum wire self-ordered growth seeded by electron-beam lithography
B. Dwir
,
F. Reinhardt
,
H. Wehman
,
A. Gustafsson
,
E. Kapon
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 376 KB
Your tags:
english, 1997
22
Electron beam lithography of phase mask gratings for near field holographic production of optical fibre gratings
X. Liu
,
J.S. Aitchison
,
R.M. De La Rue
,
S. Thoms
,
L. Zhang
,
J.A.R. Williams
,
I. Bennion
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 340 KB
Your tags:
english, 1997
23
Investigation of photoresist-specific linearity in optical lithography
Brian Martin
,
Graham Arthur
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 235 KB
Your tags:
english, 1997
24
Fabrication of site-controlled metal dot array by electron beam surface modification
K. Tsutsui
,
K. Uejima
,
K. Kawasaki
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 281 KB
Your tags:
english, 1997
25
Fabrication and properties of dot array using electron-beam-induced deposition
M. Komuro
,
H. Hiroshima
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 264 KB
Your tags:
english, 1997
26
Gold nanograins deposited from a liquid metal ion source
C. Vieu
,
J. Gierak
,
C. David
,
Y. Lagadec
,
A. Bourlange
,
D. Larigaldie
,
Z. Wang
,
J. Flicstein
,
H. Launois
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 394 KB
Your tags:
english, 1997
27
Magnetic tunnel junctions fabricated at tenth-micron dimensions by electron beam lithography
S.A. Rishton
,
Y. Lu
,
R.A. Altman
,
A.C. Marley
,
X.P. Bian
,
C. Jahnes
,
R. Viswanathan
,
G. Xiao
,
W.J. Gallagher
,
S.S.P. Parkin
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 240 KB
Your tags:
english, 1997
28
Influence of resist process on proximity bias
Wendy F.J. Gehoel-van Ansem
,
Peter Zandbergen
,
Casper A.H. Juffermans
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 302 KB
Your tags:
english, 1997
29
Sub-10 nm monogranular metallic lines formed by 200 kV electron-beam lithography and lift-off in polymethylmethacrylate resist
C. Vieu
,
M. Mejias
,
F. Carcenac
,
G. Faini
,
H. Launois
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 332 KB
Your tags:
english, 1997
30
Fabrication of submicron single-crystalline and bamboo A1 lines by recrystallization
M.J.C. van den Homberg
,
P.F.A. Alkemade
,
A.H. Verbruggen
,
A.G. Dirks
,
J.L. Hurd
,
S. Radelaar
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 302 KB
Your tags:
english, 1997
31
Selective metal deposition using metal-covered scanning tunneling microscope tips
M. Takai
,
H. Andoh
,
H. Miyazaki
,
T. Tsuruhara
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 242 KB
Your tags:
english, 1997
32
Korean Road Map for micropatterning into the next century
Ki-Ho Baik
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 680 KB
Your tags:
english, 1997
33
AFM-based fabrication of lateral single-electron tunneling structures for elevated temperature operation
L. Montelius
,
T. Junno
,
S.-B. Carlsson
,
L. Samuelson
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 238 KB
Your tags:
english, 1997
34
Nanometerscale lithography with chromium atoms using light forces
U. Drodofsky
,
J. Stuhler
,
B. Brezger
,
Th. Schulze
,
M. Drewsen
,
T. Pfau
,
J. Mlynek
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 300 KB
Your tags:
english, 1997
35
Analysis of side-lobe printability in sub-half-micron contact hole definition
Brian Martin
,
Graham Arthur
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 230 KB
Your tags:
english, 1997
36
Technologies for the fabrication of cylindrical fine line devices
G. Lullo
,
C. Arnone
,
C.G. Giaconia
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 308 KB
Your tags:
english, 1997
37
Electrical properties of 100 nm pitch CrAu fine electrodes with 40 nm width on GaInAs toward hot electron interference/diffraction devices
Hiroo Hongo
,
Hiroaki Tanaka
,
Yasuyuki Miyamoto
,
Toshihiko Otake
,
Jiroo Yoshinaga
,
Kazuhito Furuya
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 315 KB
Your tags:
english, 1997
38
Development and characterization of nitride and oxide based composite materials for sub 0.18 μm attenuated phase shift masking
Bruce W. Smith
,
Zulfiqar Alam
,
Shahid Butt
,
Santosh Kurinec
,
Richard L. Lane
,
Graham Arthur
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 297 KB
Your tags:
english, 1997
39
Large area multilayered electrode arrays for dielectrophoretic fractionation
N.G. Green
,
M.P. Hughes
,
W. Monaghan
,
H. Morgan
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 264 KB
Your tags:
english, 1997
40
Dry etch damage in III–V semiconductors
Evelyn L. Hu
,
Ching-Hui Chen
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 478 KB
Your tags:
english, 1997
41
Writing nanostructures with a metastable helium beam
S. Nowak
,
T. Pfau
,
J. Mlynek
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 324 KB
Your tags:
english, 1997
42
Fabrication and characterization of III–V compound semiconductor Bragg-Fresnel lenses for hard x-ray microfocusing
E.J. Caine
,
S. Shi
,
E.L. Hu
,
Y. Li
,
S.H.J. Idziak
,
G. Subramanian
,
C.R. Safinya
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 357 KB
Your tags:
english, 1997
43
High focal depth imaging by Beam Shaping Optical Elements?
R. Hild
,
J.C. Escalera
,
M.J. Yzuel
,
G. Nitzsche
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 250 KB
Your tags:
english, 1997
44
Two-dimensional waveguide based photonic microstructures in GaAs and InP
T.F. Krauss
,
C.J.M. Smith
,
B. Vögele
,
S.K. Murad
,
C.D.W. Wilkinson
,
R.S. Grant
,
M.G. Burt
,
R.M. De La Rue
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 287 KB
Your tags:
english, 1997
45
Focused ion beams in microsystem fabrication
J.H. Daniel
,
D.F. Moore
,
J.F. Walker
,
J.T. Whitney
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 487 KB
Your tags:
english, 1997
46
Fabrication of 10-nm Si pillars with self-formed etching masks
Tetsuya Tada
,
Toshihiko Kanayama
,
Pascal Weibel
,
Simon J. Carroll
,
Katrin Seeger
,
Richard E. Palmer
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 265 KB
Your tags:
english, 1997
47
Patterning of monolayers of crystalline S-layer proteins on a silicon surface by deep ultraviolet radiation
D. Pum
,
G. Stangl
,
C. Sponer
,
K. Riedling
,
P. Hudek
,
W. Fallmann
,
U.B. Sleytr
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 282 KB
Your tags:
english, 1997
48
Electrical characterization of SiSi0.7Ge0.3 quantum well wires fabricated by low damage CF4 reactive ion etching
K.Y. Lee
,
S.J. Koester
,
K. Ismail
,
J.O. Chu
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 291 KB
Your tags:
english, 1997
49
Fabrication and characterisation of SiGe based in-plane-gate transistors
T. Köster
,
J. Stein
,
B. Hadam
,
J. Gondermann
,
B. Spangenberg
,
H.G. Roskos
,
H. Kurz
,
M. Holzmann
,
M. Riedinger
,
G. Abstreiter
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 319 KB
Your tags:
english, 1997
50
Magnetically refined tips for Scanning Force Microscopy
R. Jumpertz
,
P. Leinenbach
,
A.W.A. van der Hart
,
J. Schelten
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 372 KB
Your tags:
english, 1997
51
New concept for ultra small N-MOSFET's
J. Gondermann
,
J. Schiepanski
,
B. Hadam
,
T. Köster
,
T. Röwer
,
J. Stein
,
B. Spangenberg
,
H. Roskos
,
H. Kurz
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 339 KB
Your tags:
english, 1997
52
The effect of surface transport on the evolution of film microstructure in plasma etching and deposition
Vivek K. Singh
,
Wayne Ford
,
Jorge Garcia-Colevatti
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 339 KB
Your tags:
english, 1997
53
Scanning probe sharp tip formation for IC integration using mesa technique
P.B. Grabiec
,
Feng Shi
,
P. Hudek
,
T. Gotszalk
,
M. Zaborowski
,
P. Dumania
,
I.W. Rangelow
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 394 KB
Your tags:
english, 1997
54
Gating high mobility silicon-germanium heterostructures
N. Griffin
,
D.J. Paul
,
M. Pepper
,
S. Taylor
,
J.P. Smith
,
W. Eccleston
,
J.M. Fernández
,
B.A. Joyce
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 293 KB
Your tags:
english, 1997
55
Copper dry etching technique for ULSI interconnections
Matthias Markert
,
Andreas Bertz
,
Thomas Gessner
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 306 KB
Your tags:
english, 1997
56
Improving the resistance of PECVD silicon nitride to dry etching using an oxygen plasma
S.E. Hicks
,
S.K. Murad
,
I. Sturrock
,
C.D.W. Wilkinson
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 292 KB
Your tags:
english, 1997
57
Development of a 100 nm gate power HEMT using four-layer resist and flexible e-beam exposure strategies
P.M. Frijlink
,
A. Collet
,
J. Bellaiche
,
M. Iost
,
M.J. Verheijen
,
H.R.J.R. van Helleputte
,
W.G.J. Moors
,
F.C.M.J.M. van Delft
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 293 KB
Your tags:
english, 1997
58
A new fabrication process for metallic point contacts
N.N. Gribov
,
S.J.C.H. Theeuwen
,
J. Caro
,
S. Radelaar
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 249 KB
Your tags:
english, 1997
59
RIE lag in high aspect ratio trench etching of silicon
Henri Jansen
,
Meint de Boer
,
Remco Wiegerink
,
Niels Tas
,
Edwin Smulders
,
Christina Neagu
,
Miko Elwenspoek
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 552 KB
Your tags:
english, 1997
60
Preparation of nanometer-scale windows in SiO2 for selective epitaxial growth of Si based devices
J.W.H. Maes
,
P.W. Lukey
,
T. Zijlstra
,
C. Visser
,
J. Caro
,
E.W.J.M. van der Drift
,
F.D. Tichelaar
,
S. Radelaar
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 295 KB
Your tags:
english, 1997
61
Micromachined Self-Aligned Microlens(SAM) for microcolumn electron beam
Yong-Jae Lee
,
Seok-Ho Kang
,
Kukjin Chun
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 239 KB
Your tags:
english, 1997
62
Electroplating: an alternative transfer technology in the 20nm range
G. Simon
,
A.M. Haghiri-Gosnet
,
F. Carcenac
,
H. Launois
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 304 KB
Your tags:
english, 1997
63
Chemical vs. physical factors in dry etching induced damage in the SiGexSi1-x system
R.G. van Veen
,
M.J. Teepen
,
E. van der Drift
,
T. Zijlstra
,
E.J.M. Fakkeldij
,
K. Werner
,
A.H. Verbruggen
,
S. Radelaar
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 334 KB
Your tags:
english, 1997
64
Electron beam induced damage of silicon germanium
D.J. Paul
,
J.M. Ryan
,
M. Pepper
,
A.N. Broers
,
T.E. Whall
,
J.M. Fernández
,
B.A. Joyce
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 304 KB
Your tags:
english, 1997
65
Direct write patterning of titanium films using focused ion beam implantation and plasma etching
J.M.Frank Zachariasse
,
John F. Walker
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 237 KB
Your tags:
english, 1997
66
Alignment accuracy evaluation of the X-ray stepper SS-1 for processed wafers
M. Suzuki
,
M. Fukuda
,
H. Tsuyuzaki
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 308 KB
Your tags:
english, 1997
67
An investigation of various post-RIE cleaning processes for dry etched InP-based HEMTs
H.C. Duran
,
R. Cheung
,
W. Patrick
,
W. Bächtold
,
I. Pfund
,
G. Hähner
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 280 KB
Your tags:
english, 1997
68
Deep, three dimensional lithography with a laser-plasma X-ray source at 1nm wavelength
ICE Turcu
,
CM Mann
,
SW Moon
,
R Allott
,
N Lisi
,
BJ Maddison
,
SE Huq
,
NS Kim
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 660 KB
Your tags:
english, 1997
69
Dry etching of all-oxide transparent thin film memory transistors
J.B. Giesbers
,
M.W.J. Prins
,
J.F.M. Cillessen
,
H.A. van Esch
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 297 KB
Your tags:
english, 1997
70
X-ray microfabrication of multi-level structures and 3-D patterning
K.J. Morris
,
Y. Vladimirsky
,
O. Vladimirsky
,
G. Calderon
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 341 KB
Your tags:
english, 1997
71
Prediction of in-plane distortions due to mask fabrication processes
M. Laudon
,
A. Fisher
,
R. Engelstad
,
F. Cerrina
,
K. Cummings
,
W. Dauksher
,
D. Resnick
,
W. Johnson
,
D. Puisto
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 301 KB
Your tags:
english, 1997
72
Nanoscale etching of resists in view of a mechanistic framework
Falco C.M.J.M. van Delft
,
J. Ben Giesbers
,
Gert-Jan Nienhuis
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 312 KB
Your tags:
english, 1997
73
A novel X-ray mask concept for mex&match lithography fabrication of MOS devices by synchrotron radiation lithography
E. Di Fabrizio
,
L. Grella
,
M. Gentili
,
M. Baciocchi
,
L. Mastrogiacomo
,
Sang-Soo Choi
,
Young Jin Jeon
,
Hyung Joun Yoo
,
Hai Bin Chung
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 253 KB
Your tags:
english, 1997
74
Fabrication of high aspect ratio structures using chlorine gas chopping technique
A.K. Paul
,
I.W. Rangelow
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 321 KB
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english, 1997
75
Accuracy of structure transfer in deep X-ray lithography
G. Feiertag
,
W. Ehrfeld
,
H. Lehr
,
A. Schmidt
,
M. Schmidt
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 307 KB
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english, 1997
76
A new approach to the cap layer thinning of GaAs based heterostructures with near surface quantum wells
T.B. Borzenko
,
Y.I. Koval
,
L.V. Kulik
,
A.V. Larionov
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 329 KB
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english, 1997
77
X-ray mask temperature distribution and magnification control
G. Dicks
,
F. Bedford
,
R. Engelstad
,
F. Cerrina
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 217 KB
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english, 1997
78
Chemical gas etching of InP-based structures
I. Maximov
,
S. Jeppesen
,
L. Montelius
,
L. Samuelson
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 220 KB
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english, 1997
79
Method of dry-etching evaluation using quantum dots
M. Rahman
,
S.K. Murad
,
M.C. Holland
,
A.R. Long
,
C.D.W. Wilkinson
,
J.G. Williamson
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 311 KB
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english, 1997
80
Comparing ion damage in GaAs and InP
D.G. Yu
,
C.-H. Chen
,
A.L. Holmes Jr.
,
E.L. Hu
,
S.P. DenBaars
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 244 KB
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english, 1997
81
Anisotropic pattern transfer of fine resist features to silicon nitride via an intermediate titanium layer
A. Midha
,
S.K. Murad
,
J.M.R. Weaver
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 360 KB
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english, 1997
82
Highly sensitive resist material for deep X-ray lithography
R. Schenk
,
O. Halle
,
K. Müllen
,
W. Ehrfeld
,
M. Schmidt
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 280 KB
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english, 1997
83
A new positive DUV photoresist optimized for 0.25 μm isolated lines
T. Lindsay
,
G.G. Barclay
,
M.F. Cronin
,
R. Dellaguardia
,
W. Conley
,
H. Ito
,
M. Mori
,
P. Hagerty
,
R. Sinta
,
T. Zydowsky
,
J.W. Thackeray
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 242 KB
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english, 1997
84
A nano-composite resist system: A new approach to nanometer pattern fabrication
T. Ishii
,
H. Nozawa
,
T. Tamamura
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 320 KB
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english, 1997
85
Calixarenes-prospective materials for nanofabrications-
Y. Ohnishi
,
J. Fujita
,
Y. Ochiai
,
S. Matsui
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 274 KB
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english, 1997
86
Electron beam resists based on oxirane functionalised polystyrenes
J.J. Murphy
,
R.G. Jones
,
G. Cordina
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 266 KB
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english, 1997
87
Electron-beam lithography resist profile simulation for highly sensitive resist
C. Lee
,
Y.M. Ham
,
S.H. Kim
,
K. Chun
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 287 KB
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english, 1997
88
Comparative study of the characteristics of octavinylsilsesquioxane dry resist in ultraviolet-, electron-beam and X-ray exposure
A. Schmidt
,
S. Babin
,
K. Böhmer
,
H.W.P. Koops
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 388 KB
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english, 1997
89
Revolutionary and evolutionary resist design concepts for 193 nm lithography
O. Nalamasu
,
T.I. Wallow
,
E. Reichmanis
,
A.E. Novembre
,
F.M. Houlihan
,
G. Dabbagh
,
D.A. Mixon
,
R.S. Hutton
,
A.G. Timko
,
O.R. Wood
,
R.A. Cirelli
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 281 KB
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english, 1997
90
Effect of temperature variations in the post-exposure processes of optical lithography
G. Arthur
,
N. Eilbeck
,
B. Martin
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 282 KB
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english, 1997
91
Thermal analysis of photoresists in aid of lithographic process development
E. Tegou
,
E. Gogolides
,
M. Hatzakis
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 257 KB
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english, 1997
92
Optimized process for electron beam nanolithography using AZPN114 chemically amplified resist
Z. Cui
,
R.A. Moody
,
I.M. Loader
,
J.G. Watson
,
P.D. Prewett
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 276 KB
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english, 1997
93
Acid and base diffusion in chemically amplified DUV resists
T. Itani
,
H. Yoshino
,
S. Hashimoto
,
M. Yamana
,
N. Samoto
,
K. Kasama
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 274 KB
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english, 1997
94
Investigation of environmental stability in chemically amplified resists
H. Yoshino
,
T. Itani
,
S. Hashimoto
,
M. Yamana
,
N. Samoto
,
K. Kasama
,
A.G. Timko
,
O. Nalamasu
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 276 KB
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95
Gel formation theory approach for the modelling of negative chemically amplified e-beam resists
G. Patsis
,
I. Raptis
,
N. Glezos
,
P. Argitis
,
M. Hatzakis
,
C.J. Aidinis
,
M. Gentili
,
R. Maggiora
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 272 KB
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english, 1997
96
Study of energy broadening of high-brightness ion beams from a surface plasma Penning source and its relevance in ion projection lithography
S.K. Guharay
,
E.A. Sokolovsky
,
M. Reiser
,
J. Orloff
,
J. Melngailis
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 310 KB
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english, 1997
97
Theoretical and experimental investigations on Coulomb interactions in a two-lens focussed ion beam instrument
J. Bi
,
X.R. Jiang
,
P. Kruit
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 306 KB
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english, 1997
98
Study on optimization of annular off-axis illumination using Taguchi method for 0.35 μm dense line/space
Wen-an Loong
,
Jin-chi Tseng
,
Tzu-ching Chen
,
Chien-an Lung
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 281 KB
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english, 1997
99
Analysis of stencil mask distortion in ion projection lithography
L. Didenko
,
J. Melngailis
,
H. Löschner
,
G. Stengl
,
A. Chalupka
,
A. Shimkunas
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 310 KB
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english, 1997
100
EBT micro-extraction structures fabricated by focused ion-beam
A.R. Dinnis
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 315 KB
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english, 1997
101
Digital Pattern Generator for polynomially bordered shape primitives
S. Strähle
,
K.-D. Schock
,
F.E. Prins
,
D.P. Kern
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 212 KB
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english, 1997
102
Fabrication of buried quantum structures using FIB-MBE total vacuum process
F. Wakaya
,
J. Yanagisawa
,
T. Matsubara
,
H. Nakayama
,
Y. Yuba
,
S. Takaoka
,
K. Murase
,
K. Gamo
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 289 KB
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english, 1997
103
Fabrication of MSM detector structures on silicon by focused ion beam implantation
J. Teichert
,
L. Bischoff
,
S. Hausmann
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 239 KB
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english, 1997
104
New method for fabrication of an array of individually controllable miniaturized electrostatic lenses
H.S. Gross
,
F.E. Prins
,
D.P. Kern
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 210 KB
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english, 1997
105
A one-dimensional demonstration of spatial-phase-locked electron-beam lithography
J. Goodberlet
,
S. Silverman
,
J. Ferrera
,
M. Mondol
,
M.L. Schattenburg
,
Henry I. Smith
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 334 KB
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english, 1997
106
The SCALPEL proof of concept system
L.R. Harriott
,
S.D. Berger
,
C. Biddick
,
M.I. Blakey
,
S.W. Bowler
,
K. Brady
,
R.M. Camarda
,
W.F. Connelly
,
A. Crorken
,
J. Custy
,
R. DeMarco
,
R.C. Farrow
,
J.A. Felker
,
L. Fetter
,
R. Freeman
,
L. Hopkins
,
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 296 KB
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english, 1997
107
Electrostatic wafer and wafer-carrier holding mechanisms for the EB-X2 e-beam writer
T. Kunioka
,
Y. Takeda
,
N. Shimazu
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 440 KB
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english, 1997
108
Process latitude enhancement for 3D structure formation in e-beam lithography
V.A. Kudryashov
,
V.V. Krasnov
,
P.D. Prewett
,
T.J. Hall
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 295 KB
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english, 1997
109
Nanofabrication using self-narrowing atomic beams
Victor T. Petrashov
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 188 KB
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english, 1997
110
Reducing recursive effect for fast proximity correction
S.-Y. Lee
,
B. Liu
,
B.D. Cook
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 302 KB
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english, 1997
111
Proximity correction for e-beam patterned sub-500nm diffractive optical elements
L. Grella
,
E. Di Fabrizio
,
M. Gentili
,
M. Baciocchi
,
R. Maggiora
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 308 KB
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english, 1997
112
An MOS transistor with Schottky source/drain contacts and a self-aligned low-resistance T-gate
S.A. Rishton
,
K. Ismail
,
J.O. Chu
,
K. Chan
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 190 KB
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english, 1997
113
Pattern generation for the next millennium
Andre Hawryliw
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 548 KB
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english, 1997
114
Economic production of submicron ASICs with laser beam direct write lithography
C. Schomburg
,
B. Höfflinger
,
R. Springer
,
R. Wijnaendts-van-Resandt
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 299 KB
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english, 1997
115
Micromilling development and applications for microfabrication
C.R. Friedrich
,
P.J. Coane
,
M.J. Vasile
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 485 KB
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english, 1997
116
Microlens lithography and smart masks
R. Völkel
,
H.P. Herzig
,
Ph. Nussbaum
,
P. Blattner
,
R. Dändliker
,
E. Cullmann
,
W.B. Hugle
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 316 KB
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english, 1997
117
Manufacturable DUV lithography processes for 0.25μm technology contact and via layers
Daniel Baker
,
Maaike Op de Beeck
,
Harry Botermans
,
Luc Van den hove
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 414 KB
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english, 1997
118
Micromechanics: A toolbox for femtoscale science: “Towards a laboratory on a tip”
R. Berger
,
Ch. Gerber
,
H.P. Lang
,
J.K. Gimzewski
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 496 KB
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english, 1997
119
Application of X-ray mask fabrication technologies to high resolution, large diameter Ta Fresnel zone plates
A. Ozawa
,
T. Tamamura
,
T. Ishii
,
H. Yoshihara
,
T. Kagoshima
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 330 KB
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english, 1997
120
Properties of thin anti-adhesive films used for the replication of microstructures in polymers
R.W. Jaszewski
,
H. Schift
,
P. Gröning
,
G. Margaritondo
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 331 KB
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english, 1997
121
Vibratory analysis of an X-ray mask membrane during stepping
D.L. Laird
,
R.L. Engelstad
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 282 KB
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english, 1997
122
Fabrication of refractive microlenses in semiconductors by mask shape transfer in reactive ion etching
E.M. Strzelecka
,
G.D. Robinson
,
L.A. Coldren
,
E.L. Hu
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 297 KB
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english, 1997
123
Low cost fabrication of micromechanical systems
Zheng Cui
,
Ron A. Lawes
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 269 KB
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english, 1997
124
Embossing of nanoscale features and environments
B.G. Casey
,
W. Monaghan
,
C.D.W. Wilkinson
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 356 KB
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english, 1997
125
Bulk silicon micromachining using porous silicon sacrificial layers
G. Kaltsas
,
A.G. Nassiopoulos
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 230 KB
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english, 1997
126
Silicon micro/nanomechanical device fabrication based on focused ion beam surface modification and KOH etching
J. Brugger
,
G. Beljakovic
,
M. Despont
,
N.F. de Rooij
,
P. Vettiger
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 286 KB
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english, 1997
127
Preface
C.D.W. Wilkinson
,
S.P. Beaumont
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 138 KB
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english, 1997
128
Liquid-target laser-plasma source for X-ray lithography
L. Malmqvist
,
A.L. Bogdanov
,
L. Montelius
,
H.M. Hertz
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 97 KB
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english, 1997
129
Author index volume 35
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 789 KB
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130
Editorial Board
Journal:
Microelectronic Engineering
Year:
1997
Language:
english
File:
PDF, 64 KB
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english, 1997
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