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RIE lag in high aspect ratio trench etching of silicon
Henri Jansen, Meint de Boer, Remco Wiegerink, Niels Tas, Edwin Smulders, Christina Neagu, Miko ElwenspoekVolume:
35
Year:
1997
Language:
english
Pages:
6
DOI:
10.1016/s0167-9317(96)00142-6
File:
PDF, 552 KB
english, 1997