A novel X-ray mask concept for mex&match lithography...

Microelectronic Engineering 1997 Vol. 35; Iss. 1-4

A novel X-ray mask concept for mex&match lithography fabrication of MOS devices by synchrotron radiation lithography

E. Di Fabrizio, L. Grella, M. Gentili, M. Baciocchi, L. Mastrogiacomo, Sang-Soo Choi, Young Jin Jeon, Hyung Joun Yoo, Hai Bin Chung
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Volume:
35
Year:
1997
Language:
english
Pages:
4
DOI:
10.1016/s0167-9317(96)00156-6
File:
PDF, 253 KB
english, 1997
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