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Revolutionary and evolutionary resist design concepts for 193 nm lithography
O. Nalamasu, T.I. Wallow, E. Reichmanis, A.E. Novembre, F.M. Houlihan, G. Dabbagh, D.A. Mixon, R.S. Hutton, A.G. Timko, O.R. Wood, R.A. CirelliVolume:
35
Year:
1997
Language:
english
Pages:
4
DOI:
10.1016/s0167-9317(96)00172-4
File:
PDF, 281 KB
english, 1997