Optimized process for electron beam nanolithography using AZPN114 chemically amplified resist
Z. Cui, R.A. Moody, I.M. Loader, J.G. Watson, P.D. PrewettVolume:
35
Year:
1997
Language:
english
Pages:
4
DOI:
10.1016/s0167-9317(96)00175-x
File:
PDF, 276 KB
english, 1997