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Stacking fault reduction in Silicon-on-Insulator (SOI) islands produced by Selective Epitaxial Growth (SEG) of Silicon using a thermally nitrided SiO2 field insulator
Gerold W. Neudeck, Keith D. Merritt, Jack P. DentonVolume:
36
Year:
1997
Language:
english
Pages:
4
DOI:
10.1016/s0167-9317(97)00087-7
File:
PDF, 420 KB
english, 1997