New approaches to optical proximity correction in...

New approaches to optical proximity correction in photolithography

Jinglei Du, Qizhong Huang, Jingqin Su, Yongkang Guo, Zheng Cui
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Volume:
46
Year:
1999
Language:
english
Pages:
4
DOI:
10.1016/s0167-9317(99)00018-0
File:
PDF, 266 KB
english, 1999
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