Volume 46; Issue 1-4

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Microelectronic Engineering
Volume 46; Issue 1-4

Microelectronic Engineering

Volume 46; Issue 1-4

1

CMOS and memories: From 100 nm to 10 nm!: Invited Paper

Sandip Tiwari, Paul M. Solomon, J.J. Welser, E.C. Jones, F.R. McFeely, E. Cartier

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 1.08 MB

english, 1999

2

CMOS device fabrication and the evolution of optical lithographic exposure tools

William H Arnold

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 187 KB

english, 1999

3

Ultrahigh density, high-data-rate NEMS-based AFM data storage system

P. Vettiger, J. Brugger, M. Despont, U. Drechsler, U. Dürig, W. Häberle, M. Lutwyche, H. Rothuizen, R. Stutz, R. Widmer, G. Binnig

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 2.20 MB

english, 1999

4

Progress in the development of extreme ultraviolet lithography exposure systems

Richard. H. Stulen

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 643 KB

english, 1999

5

Modeling and simulation of membrane distortions in Next Generation Lithography (NGL) masks

R. Engelstad, E. Lovell, G. Dicks, A. Fisher, R. Tejeda

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 1.08 MB

english, 1999

6

Novel optical probing and micromachining techniques for silicon debug of flip chip packaged microprocessors

Mario Paniccia, T. Eiles, R. Livengood, V.R.M. Rao, P. Winer, Wai Mun Yee

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 2.24 MB

english, 1999

7

Understanding CD variations in optical lithography using predictive modeling techniques

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 652 KB

english, 1999

8

Three paths to improved critical dimension control for patterning 200 nm to 100 nm transistor gates

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 375 KB

english, 1999

9

Surface treatment validation of inorganic BARC on 0.25 μm Non Volatile Memory technology

Y. Trouiller, A. Didiergeorges, N. Buffet, T. Mourier, C. Laviron, Y. Quere

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 1.27 MB

english, 1999

10

CD control using SiON BARL processing for sub-0.25 μm lithography

F. Zhang, M. Op de Beeck, M. Schaekers, K. Ronse, W. Conley, P. Gopalan, H. Gangala, M. Dusa, J. Bendik

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 342 KB

english, 1999

11

Optical proximity correction by e-beam over-correction

C.H. Lin, S.D. Tzu, Anthony Yen

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 1.38 MB

english, 1999

12

Lithography simulation with aerial image — Variable threshold resist model

John Randall, Hareen Gangala, Alexander Tritchkov

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 466 KB

english, 1999

13

Data analysis for photolithography

Chris A. Mack, Dale A. Legband, Sven Jug

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 295 KB

english, 1999

14

Mold-assisted near-field optical lithography

Y. Chen, F. Carcenac, C. Ecoffet, D.J. Lougnot, H. Launois

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 1.32 MB

english, 1999

15

New approaches to optical proximity correction in photolithography

Jinglei Du, Qizhong Huang, Jingqin Su, Yongkang Guo, Zheng Cui

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 266 KB

english, 1999

16

Effect of develop time on process windows in sub-half micron optical lithography

G. Arthur, B. Martin, C. Wallace

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 288 KB

english, 1999

17

Real time proximity effects neurocorrector

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 313 KB

english, 1999

18

Nanolithography using optical contact exposure in the evanescent near field

R.J. Blaikie, M.M. Alkaisi, S.J. McNab, D.R.S. Cumming, R. Cheung, D.G. Hasko

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 1.58 MB

english, 1999

19

0.3 μm contact layer: process characterisation

C. Romeo, F. Canali, L. Riva

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 1.04 MB

english, 1999

20

TiSixNy and TiSixOyNz as embedded materials for attenuated phase-shifting mask in 193 nm

Cheng-ming Lin, Wen-an Loong

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 435 KB

english, 1999

21

Can we do 0.15μm lithography with KrF?

Nigel Farrar, Will Conley, Hareen Gangala, Carl Babcock, Hua-Yu Liu

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 640 KB

english, 1999

22

Manipulation of carbon nanotubes and properties of nanotube field-effect transistors and rings

H.R. Shea, R. Martel, T. Hertel, T. Schmidt, Ph. Avouris

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 1.34 MB

english, 1999

23

Sub-100 nm structures by neutral atom lithography

Th. Schulze, B. Brezger, P.O. Schmidt, R. Mertens, A.S. Bell, T. Pfau, J. Mlynek

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 1019 KB

english, 1999

24

6.6 MHz silicon AFM cantilever for high-speed readout in AFM-based recording

S. Hosaka, K. Etoh, A. Kikukawa, H. Koyanagi, K. Itoh

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 619 KB

english, 1999

25

Tip-on-tip: a novel AFM tip configuration for the electrical characterization of semiconductor devices

T. Hantschel, T. Trenkler, W. Vandervorst, A. Malavé, D. Büchel, W. Kulisch, E. Oesterschulze

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 851 KB

english, 1999

26

Si nanostructures fabricated by nanoscale local oxidation using an ECR plasma nitride nanomask

K. Kurihara, Y. Watanabe, M. Nagase

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 1.09 MB

english, 1999

27

Nanostructuring of polymers and fabrication of interdigitated electrodes by hot embossing lithography

H. Schift, R.W. Jaszewski, C. David, J. Gobrecht

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 1.97 MB

english, 1999

28

Nanoscale embossing of polymers using a thermoplastic die

B.G. Casey, D.R.S. Cumming, I.I. Khandaker, A.S.G. Curtis, C.D.W. Wilkinson

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 1.82 MB

english, 1999

29

Computation of reflected images from EUV masks

Srinivas B. Bollepalli, Franco Cerrina

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 675 KB

english, 1999

30

Supercritical drying for nanostructure fabrication without pattern collapse

Hideo Namatsu, Kenji Yamazaki, Kenji Kurihara

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 1.23 MB

english, 1999

31

A gas discharged based radiation source for EUV-lithography

R. Lebert, K. Bergmann, G. Schriever, W. Neff

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 549 KB

english, 1999

32

Technology for nanoelectronic devices based on ultra-high vacuum scanning tunneling microscopy on the Si(100) surface

G. Palasantzas, B. Ilge, S. Rogge, L.J. Geerligs

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 1.37 MB

english, 1999

33

Liquid-jet target laser-plasma sources for EUV and X-ray lithography

L. Rymell, L. Malmqvist, M. Berglund, H.M. Hertz

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 233 KB

english, 1999

34

Single-hole tunnelling in SiGe nanostructures

S. Kanjanachuchai, J.M. Bonar, G.J. Parker, H. Ahmed

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 797 KB

english, 1999

35

Fabrication and characterisation of Coulomb blockade devices in silicon

R. Augke, W. Eberhardt, S. Strähle, F.E. Prins, D.P. Kern

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 558 KB

english, 1999

36

Overlay budget analysis for the 100 nm device generation

K. Simon, O. Vladimirsky, Y. Vladimirsky, F. Cerrina

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 406 KB

english, 1999

37

Evaluation of advanced epoxy novolac resist, EPR, for sub 100nm synchrotron x-ray proximity lithography

Yongduck Seo, Kyoungho Lee, Moonsuk Yi, Eunsung Seo, Bo Kyung Choi, Ohyun Kim, Ioannis Raptis, Panayiotis Argitis, Michael Hatzakis

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 803 KB

english, 1999

38

Comparison of laser produced and gas discharge based EUV sources for different applications

R. Lebert, K. Bergmann, G. Schriever, W. Neff

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 309 KB

english, 1999

39

Maskless ion beam lithography system

Y. Lee, R.A. Gough, T.J. King, Q. Ji, K.N. Leung, R.A. McGill, V.V. Ngo, M.D. Williams, N. Zahir

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 875 KB

english, 1999

40

SOI wafer flow process for stencil mask fabrication

J. Butschke, A. Ehrmann, B. Höfflinger, M. Irmscher, R. Käsmaier, F. Letzkus, H. Löschner, J. Mathuni, C. Reuter, C. Schomburg, R. Springer

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 1.56 MB

english, 1999

41

Resolution improvement of ion projector with a low energy spread multicusp ion source

W.H. Bruenger, M. Torkler, K.N. Leung, Y. Lee, M.D. Williams, H. Loeschner, G. Stengl, W. Fallmann, F. Paschke, G. Stangl, I.W. Rangelow, P. Hudek

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 1.12 MB

english, 1999

42

Stress relief structures for ion-beam projection lithography masks

R. Tejeda, R. Engelstad, E. Lovell, E. Haugeneder, H. Löschner

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 1.42 MB

english, 1999

43

Finite element simulation of ion-beam lithography mask fabrication

R. Tejeda, G. Frisque, R. Engelstad, E. Lovell, E. Haugeneder, H. Löschner

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 1.22 MB

english, 1999

44

Nonorganic evaporation mask for superconducting nanodevices

T. Hoss, C. Strunk, C. Schönenberger

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 958 KB

english, 1999

45

Stencil masks for high energy ion projection

U. Weidenmüller, J. Meijer, A. Stephan, H.H. Bukow, C. Rolfs

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 946 KB

english, 1999

46

Capability of ion beam projection optics for microfabrication

Y. Madokoro, S. Tomimatsu, Y. Kawanami, K. Umemura

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 442 KB

english, 1999

47

A very-high-density scintillation-data-storage device

James G. Goodberlet

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 488 KB

english, 1999

48

Single-electron transistor controlled by environmental impedance: Effects of capacitive environmental impedance

F. Wakaya, F. Yoshioka, S. Furuichi, H. Higurashi, S. Iwabuchi, Y. Nagaoka, K. Gamo

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 586 KB

english, 1999

49

Shadow evaporation method for fabrication of sub 10 nm gaps between metal electrodes

G. Philipp, T. Weimann, P. Hinze, M. Burghard, J. Weis

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 1.73 MB

english, 1999

50

Fabrication of self-standing, size-adjustable nickel structures with nanometer resolution

E. Di Fabrizio, M. Gentili, L. Mastrogiacomo

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 1.42 MB

english, 1999

51

Fabrication of a metallic single electron tunneling transistor by multilayer technique using lithography with a scanning transmission electron microscope

Th. Weimann, P. Hinze, H. Scherer, J. Niemeyer

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 1.26 MB

english, 1999

52

Resonant tunnelling effect in delta doped p-n GaAs junction

S.A. Vitusevich, A. Förster, A.E. Belyaev, K.M. Indlekofer, H. Lüth, R.V. Konakova

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 259 KB

english, 1999

53

Metal wire definition by high resolution imprint and lift-off

D. Eisert, W. Braun, S. Kuhn, J. Koeth, A. Forchel

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 1.77 MB

english, 1999

54

Fabrication of sub-quarter-micron grating patterns by employing DUV holographic lithography

L.A. Wang, C.H. Lin, J.H. Chen

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 790 KB

english, 1999

55

Hot Electron Emission Lithography: a method for efficient large area e-beam projection

M. Poppeller, E. Cartier, R.M. Tromp

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 1.22 MB

english, 1999

56

100-kV advanced nanoelectron-beam exposure system for 8,12 ″ wafers and x-ray masks

Yukinori Ochiai, Takashi Ogura, Tohru Mogami

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 764 KB

english, 1999

57

Run-time correction of proximity effects in raster scan pattern generator systems

L. Veneklasen, U. Hofmann, L. Johnson, V. Boegli, R. Innes

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 936 KB

english, 1999

58

Cellector: A new software tool for the support of cell projection in combination with variable shape electron beam lithography for mask and direct write applications

H. Hartmann, R. Steinmetz, T. Waas, P. Hahmann, Ch. Ehrlich

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 690 KB

english, 1999

59

Study of nanometer resolution resist slope for the UVIII chemically amplified resist

A. Gerardino, M. Gentili, E. Di Fabrizio, R. Calarco, L. Mastrogiacomo

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 1.40 MB

english, 1999

60

An object pattern post-processor for validation of electron optical modelling

E. Munro, X. Zhu, H. Liu, J.A. Rouse, W.K. Waskiewicz

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 666 KB

english, 1999

61

A new e-beam method for grey scale 3D optical elements

V.A. Kudryashov, P.D. Prewett, A.G. Michette

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 763 KB

english, 1999

62

Functional scanning electron microscope of low beam energy with integrated electron optical system for nanolithography

A. Zlatkin, N. García

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 1.10 MB

english, 1999

63

Line width control using a defocused low voltage electron beam

C. David, D. Hambach

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 1.26 MB

english, 1999

64

SCALPEL mask-membrane charging

M. Mkrtchyan, A. Gasparyan, K. Mkhoyan, A. Liddle, A. Novembre, D. Muller

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 378 KB

english, 1999

65

SCALPEL mask defect imaging analysis

Stuart T. Stanton, J. Alexander Liddle, Anthony E. Novembre, Masis M. Mkrtchyan

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 453 KB

english, 1999

66

Simulation and measurement of resist heating in multipass exposure using a 50 kV variably shaped beam system

S. Babin, H. Hartmann, I.Yu. Kuzmin

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 1.31 MB

english, 1999

67

Initial wafer heating analysis for a SCALPEL lithography system

Stuart T. Stanton, J. Alexander Liddle, Gregg M. Gallatin, Byungkyu Kim, Roxanne L. Engelstad

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 499 KB

english, 1999

68

Optimization of a SCALPEL® exposure tool using a diffractive image quality technique

L. Eichner, M.I. Blakey, R.C. Farrow, J.A. Liddle, P.A. Orphanos, W.K. Waskiewicz

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 872 KB

english, 1999

69

How to overcome the principal limitations of SEM columns for the use in e-beam lithography?

S.V. Dubonos, B.N. Gaifullin, H.R. Raith, A.A. Svintsov, S.I. Zaitsev

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 1.04 MB

english, 1999

70

40 keV shaped electron beam lithography for LIGA intermediate mask fabrication

R. Lüttge, D. Adam, F. Burkhardt, F. Hoke, H. Schacke, M. Schmidt, H. Wolf, A. Schmidt

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 1.12 MB

english, 1999

71

Fabrication of phase masks, for fiber grating printing, using EBL and CHF3 RIE

M. Ardito, L. Boschis, R. Palumbo, G. Meneghini

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 926 KB

english, 1999

72

Comparative study of AZPF514 and UVIII chemically amplified resists for electron beam nanolithography

Zheng Cui, Phil Prewett

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 1.73 MB

english, 1999

73

Mask membrane distortions due to pattern transfer for electron-beam lithography (SCALPEL) masks

G. Dicks, R. Engelstad, E. Lovell, J. Liddle

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 1.26 MB

english, 1999

74

CMOS compatible alignment marks for the SCALPEL proof of lithography tool

R.C. Farrow, W.K. Waskiewicz, I. Kizilyalli, L. Ocola, J. Felker, C. Biddick, G. Gallatin, M. Mkrtchyan, M. Blakey, J. Kraus, A. Novembre, P. Orphanos, M. Peabody, R. Kasica, A. Kornblit, F. Klemens

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 562 KB

english, 1999

75

Performance of an image adjustment device for SCALPEL

W.K. Waskiewicz

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 1.23 MB

english, 1999

76

Pattern processing results and characteristics for SCALPEL masks

A.E. Novembre, M.I. Blakey, R.C. Farrow, R.J. Kasica, C.S. Knurek, J.A. Liddle, M.L. Peabody

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 1.21 MB

english, 1999

77

Pre-structuring of silicon substrates to investigate MBE-growth of SiGe layers

C. David, R. Hartmann, U. Gennser, E. Müller, D. Grützmacher

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 1.29 MB

english, 1999

78

Inspection of stencil mask using transmission electrons for character projection electron beam lithography

T. Okagawa, K. Matsuoka, Y. Kojima, A. Yoshida, S. Matsui, I. Santo, N. Anazawa, T. Kaito

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 1.25 MB

english, 1999

79

Electron beam lithography simulation for mask making

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 589 KB

english, 1999

80

Process optimisation of DUV photoresists for electron beam lithography

S. Thoms, D. Macintyre

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 788 KB

english, 1999

81

Distributed proximity effect correction on a network of workstations

S.-Y. Lee, G.D. Ghare

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 311 KB

english, 1999

82

Study of thin gate oxide etching during plasma patterning of 0.1 μm Si gates

L. Desvoivres, M. Bonvalot, L. Vallier, O. Joubert

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 413 KB

english, 1999

83

Design considerations for low damage process plasmas

M. Rahman, L.G. Deng, A. Boyd, A. Ribayrol, C.D.W. Wilkinson, J.A. van den Berg, D.G. Armour

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 315 KB

english, 1999

84

Grey-tone lithography and dry etching technique for the fabrication of integrated spot size converters

S. Ullerich, R. Steingrüber, A. Umbach

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 922 KB

english, 1999

85

Improved post etch cleaning for low-k and copper integration for 0.18μm technology

D. Louis, C. Peyne, E. Lajoinie, B. Vallesi, D. Holmes, D. Maloney, S. Lee

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 1.29 MB

english, 1999

86

SiO2 and Si etching in fluorocarbon plasmas: A detailed surface model coupled with a complete plasma and profile simulator.

E. Gogolides, P. Vauvert, Y. Courtin, G. Kokkoris, R. Pelle, A. Boudouvis, G. Turban

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 1.18 MB

english, 1999

87

Scaling of silicon trench etch rates and profiles in plasma etching

V.F. Lukichev, V.A. Yunkin

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 850 KB

english, 1999

88

Nanoimprint lithography for a large area pattern replication

A. Lebib, Y. Chen, J. Bourneix, F. Carcenac, E. Cambril, L. Couraud, H. Launois

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 1.10 MB

english, 1999

89

Comparison of the etching behavior of GaAs and GaN in a chemically-assisted ion-beam etching system

F. Eberhard, M. Schauler, E. Deichsel, C. Kirchner, P. Unger

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 1.29 MB

english, 1999

90

Modified AlAs epitaxial layers for use as pattern transfer masks

C.J.M. Smith, T.F. Krauss, S.K. Murad, C.D.W. Wilkinson, A. Boyd, C.R. Stanley, M. Dawson, R.M. De La Rue

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 947 KB

english, 1999

91

Damage characterization of anisotropic InP patterns obtained by SiCl4 reactive ion etching

L. Manin-Ferlazzo, F. Carcenac, R. Teissier, G. Faini, D. Mailly

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 1.40 MB

english, 1999

92

Integration considerations for 193nm photoresists

M. McCallum, K.R. Dean, J.D. Byers

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 437 KB

english, 1999

93

Resist surface investigations for reduction of Line-Edge-Roughness in Top Surface Imaging technology

T. Sugihara, F. Van Roey, A.M. Goethals, K. Ronse, L. Van den hove

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 1.18 MB

english, 1999

94

Development of APSM resists for sub-200nm contact holes

M. Rajaratnam, M. Reilly, D. Pai, D. Kang, J. Thackeray, J. Georger, G. Orsula, Zhijian Lu, H. Ito

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 992 KB

english, 1999

95

Optimization of Plasma Polymerized Methylsilane process for 248 and 193 nm lithography applications

C. Monget, D. Fuard, O. Joubert, J.P. Panabière

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 794 KB

english, 1999

96

Molecular dynamics simulation of gel formation and acid diffusion in negative tone chemically amplified resists

G.P. Patsis, N. Glezos

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 631 KB

english, 1999

97

Analytical model of the “Shot Noise” effect in photoresist

Gregg M. Gallatin, J. Alexander Liddle

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 435 KB

english, 1999

98

Bilayer resist used in e-beam lithography for deep narrow structures

Falco C.M.J.M. van Delft

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 3.92 MB

english, 1999

99

Process optimization of a chemically amplified negative resist for electron beam exposure and mask making applications

E. Ainley, K. Nordquist, D.J. Resnick, D.W. Carr, R.C. Tiberio

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 1.20 MB

english, 1999

100

Simulation of chemically amplified resist processes for 150 nm e-beam lithography

A. Rosenbusch, Z. Cui, E. DiFabrizio, M. Gentili, N. Glezos, G. Meneghini, B. Nowotny, G. Patsis, P. Prewett, I. Raptis

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 1.02 MB

english, 1999

101

DUV resists in negative tone high resolution electron beam lithography

Falco C.M.J.M. van Delft, Frans G. Holthuysen

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 2.58 MB

english, 1999

102

Evaluation of ma-N 2400 series DUV photoresist for electron beam exposure

H. Elsner, H.-G. Meyer, A. Voigt, G. Grützner

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 1.78 MB

english, 1999

103

Properties and mutual interactions of various acrylate monomers used in 193 nm resists

P.J. Paniez, F. Perrier, M. Panabiere, B. Mortini, C. Rosilio

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 287 KB

english, 1999

104

Fabrication of micro-electrode arrays for biotechnological applications

N.G. Green, H. Morgan, W. Monaghan, M. Robertson

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 2.17 MB

english, 1999

105

Microfabricated double layer octupoles for microcolumn applications

C. Stebler, T. Pfeffer, U. Staufer, N.F. de Rooij

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 1.46 MB

english, 1999

106

A design and fabrication of a 3D force sensitive microprobe for surface characterization

P.B. Grabiec, R. Sunyk, F. Shi, G. Popovic, T. Gotszalk, P. Hudek, P. Dumania, I.W. Rangelow

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 1.49 MB

english, 1999

107

Three-dimensional micro-structures for the embedding of living cells

K. Otte, K. Zimmer, U. Zeitschel, A. Braun, D. Hirsch, F. Bigl, V. Bigl

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 1.47 MB

english, 1999

108

12 kV low current cascaded light triggered switch on one silicon chip

V. Mankowski, U. Hilleringmann, K. Schumacher

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 1008 KB

english, 1999

109

Fabrication of integrated microanalytical chambers and channels for biological assays using flame hydrolysis deposition glass

J.M. Ruano, D. Ortega, J.R. Bonar, A.J. McLaughlin, M.G. Jubber, J.M. Cooper, J.S. Aitchison

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 609 KB

english, 1999

110

Fabrication of field emission Si-tip array using reduced submicron masks generated by isotropic etching of mask patterns

D.W. Kim, S.H. Lym, M.Y. Jung, H.T. Jeon, S.S. Choi

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 1.00 MB

english, 1999

111

Micromachined Si3N4-tip on Cantilever for parallel SFM and NSOM applications

M.Y. Jung, S.S. Choi, I.W. Lyo

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 1.04 MB

english, 1999

112

Suitability of new polymer materials with adjustable glass temperature for nano-imprinting

K. Pfeiffer, G. Bleidiessel, G. Gruetzner, H. Schulz, T. Hoffmann, H.-C. Scheer, C.M. Sotomayor Torres, J. Ahopelto

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 726 KB

english, 1999

113

Fabrication of ultra-thin free-standing chromium foils supported by a Si3N4 membrane-structure with search pattern

I.S. Stepanov, R.H. van Aken, M.R. Zuiddam, C.W. Hagen

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 1.16 MB

english, 1999

114

Fabrication and application of polymer coated cantilevers as gas sensors

M. Maute, S. Raible, F.E. Prins, D.P. Kern, U. Weimar, W. Göpel

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 672 KB

english, 1999

115

Preface

Luc Van den hove, Marc Van Rossum, Kurt Ronse

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 66 KB

english, 1999

116

Optimization of an advanced positive DUV resist for 248 nm L/S pattern printing

M. Ercken, M. Moelants, I. Pollers, I. van Puyenbroeck, M. Goethals, K. Ronse, G. Pawlowski, W. Spiess

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 1.17 MB

english, 1999

117

Author index volume 46

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 812 KB

english, 1999

118

Editorial Board

Journal:

Microelectronic Engineering

Year:

1999

Language:

english

File:

PDF, 59 KB

english, 1999

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