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Nanolithography using optical contact exposure in the evanescent near field
R.J. Blaikie, M.M. Alkaisi, S.J. McNab, D.R.S. Cumming, R. Cheung, D.G. HaskoVolume:
46
Year:
1999
Language:
english
Pages:
4
DOI:
10.1016/s0167-9317(99)00021-0
File:
PDF, 1.58 MB
english, 1999