Evaluation of advanced epoxy novolac resist, EPR, for sub...

Microelectronic Engineering 1999 Vol. 46; Iss. 1-4

Evaluation of advanced epoxy novolac resist, EPR, for sub 100nm synchrotron x-ray proximity lithography

Yongduck Seo, Kyoungho Lee, Moonsuk Yi, Eunsung Seo, Bo Kyung Choi, Ohyun Kim, Ioannis Raptis, Panayiotis Argitis, Michael Hatzakis
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Volume:
46
Year:
1999
Language:
english
Pages:
4
DOI:
10.1016/s0167-9317(99)00040-4
File:
PDF, 803 KB
english, 1999
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