Finite element simulation of ion-beam lithography mask fabrication
R. Tejeda, G. Frisque, R. Engelstad, E. Lovell, E. Haugeneder, H. LöschnerVolume:
46
Year:
1999
Language:
english
Pages:
4
DOI:
10.1016/s0167-9317(99)00046-5
File:
PDF, 1.22 MB
english, 1999