Mask membrane distortions due to pattern transfer for electron-beam lithography (SCALPEL) masks
G. Dicks, R. Engelstad, E. Lovell, J. LiddleVolume:
46
Year:
1999
Language:
english
Pages:
4
DOI:
10.1016/s0167-9317(99)00076-3
File:
PDF, 1.26 MB
english, 1999