SiO2 and Si etching in fluorocarbon plasmas: A detailed surface model coupled with a complete plasma and profile simulator.
E. Gogolides, P. Vauvert, Y. Courtin, G. Kokkoris, R. Pelle, A. Boudouvis, G. TurbanVolume:
46
Year:
1999
Language:
english
Pages:
4
DOI:
10.1016/s0167-9317(99)00091-x
File:
PDF, 1.18 MB
english, 1999