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Nanoimprint lithography for a large area pattern replication
A. Lebib, Y. Chen, J. Bourneix, F. Carcenac, E. Cambril, L. Couraud, H. LaunoisVolume:
46
Year:
1999
Language:
english
Pages:
4
DOI:
10.1016/s0167-9317(99)00094-5
File:
PDF, 1.10 MB
english, 1999