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Simulation of chemically amplified resist processes for 150 nm e-beam lithography
A. Rosenbusch, Z. Cui, E. DiFabrizio, M. Gentili, N. Glezos, G. Meneghini, B. Nowotny, G. Patsis, P. Prewett, I. RaptisVolume:
46
Year:
1999
Language:
english
Pages:
4
DOI:
10.1016/s0167-9317(99)00111-2
File:
PDF, 1.02 MB
english, 1999