Evaluation of ma-N 2400 series DUV photoresist for electron...

Microelectronic Engineering 1999 Vol. 46; Iss. 1-4

Evaluation of ma-N 2400 series DUV photoresist for electron beam exposure

H. Elsner, H.-G. Meyer, A. Voigt, G. Grützner
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Volume:
46
Year:
1999
Language:
english
Pages:
4
DOI:
10.1016/s0167-9317(99)00113-6
File:
PDF, 1.78 MB
english, 1999
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