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Atomistic study of the formation process of Ni silicide on the Si(111)-7×7 surface with scanning tunneling microscopy
Takafumi Yao, Shinji Shinabe, Masamichi YoshimuraVolume:
104-105
Year:
1996
Language:
english
Pages:
5
DOI:
10.1016/s0169-4332(96)00146-8
File:
PDF, 316 KB
english, 1996