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Effect of plasma oxidized Al prelayer for the epitaxial growth of Al2O3 films on Si using magnetron sputtering
Kiyoteru Hayama, Hidenori Ohyama, Tomoyuki Okuhara, Makoto IshidaVolume:
117-118
Year:
1997
Language:
english
Pages:
4
DOI:
10.1016/s0169-4332(97)80132-8
File:
PDF, 326 KB
english, 1997