In situ process monitoring in plasma immersion ion...

Surface and Coatings Technology 2002 Vol. 156; Iss. 1-3

In situ process monitoring in plasma immersion ion implantation based on measurements of secondary electron emission coefficient

Keiji Nakamura, Mitsuaki Tanaka, Hideo Sugai
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Volume:
156
Year:
2002
Language:
english
Pages:
4
DOI:
10.1016/s0257-8972(02)00127-5
File:
PDF, 373 KB
english, 2002
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