Numerical investigation of a low-electron-temperature ECR...

Surface and Coatings Technology 2002 Vol. 171; Iss. 1-3

Numerical investigation of a low-electron-temperature ECR plasma in Ar/N2 mixtures

Hiroshi Muta, Mayuko Koga, Nao Itagaki, Yoshinobu Kawai
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Volume:
171
Year:
2002
Language:
english
Pages:
5
DOI:
10.1016/s0257-8972(03)00261-5
File:
PDF, 132 KB
english, 2002
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