Effect of N-containing additive gases on global warming gas emission during remote plasma cleaning process of silicon nitride PECVD chamber using C4F8/O2/Ar chemistry
C.H. Oh, N.-E. Lee, J.H. Kim, G.Y. Yeom, S.S. Yoon, T.K. KwonVolume:
171
Year:
2002
Language:
english
Pages:
6
DOI:
10.1016/s0257-8972(03)00284-6
File:
PDF, 151 KB
english, 2002