Dry etching characteristics of (Ba0.6,Sr0.4)TiO3 thin films in high density CF4/Ar plasma
Pil-Seung Kang, Kyoung-Tae Kim, Dong-Pyo Kim, Chang-Il Kim, Alexander M. EfremovVolume:
171
Year:
2002
Language:
english
Pages:
7
DOI:
10.1016/s0257-8972(03)00285-8
File:
PDF, 190 KB
english, 2002