Fundamentals and limits for the EUV emission of pinch...

Journal of Physics D Applied Physics 2004 / 12 Vol. 37; Iss. 23

Fundamentals and limits for the EUV emission of pinch plasma sources for EUV lithography

Krücken, Thomas, Bergmann, Klaus, Juschkin, Larissa, Lebert, Rainer
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Volume:
37
Language:
english
Journal:
Journal of Physics D: Applied Physics
DOI:
10.1088/0022-3727/37/23/002
Date:
December, 2004
File:
PDF, 345 KB
english, 2004
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