Volume 37; Issue 23

Journal of Physics D Applied Physics

Volume 37; Issue 23

1

Electric field and dielectrophoretic force on a dielectric particle chain in a parallel-plate electrode system

Techaumnat, B, Eua-arporn, B, Takuma, T

Journal:

Journal of Physics D Applied Physics

Year:

2004

Language:

english

File:

PDF, 289 KB

english, 2004

2

Extreme ultraviolet light sources for use in semiconductor lithography—state of the art and future development

Journal:

Journal of Physics D Applied Physics

Year:

2004

Language:

english

File:

PDF, 1.36 MB

english, 2004

3

An electronically tunable ultrafast laser source applied to fluorescence imaging and fluorescence lifetime imaging microscopy

Dunsby, C, Lanigan, P M P, McGinty, J, Elson, D S, Requejo-Isidro, J, Munro, I, Galletly, N, McCann, F, Treanor, B, Önfelt, B

Journal:

Journal of Physics D Applied Physics

Year:

2004

Language:

english

File:

PDF, 1.08 MB

english, 2004

4

EUV discharge light source based on a dense plasma focus operated with positive and negative polarity

Fomenkov, I V, Böwering, N, Rettig, C L, Melnychuk, S T, Oliver, I R, Hoffman, J R, Khodykin, O V, Ness, R M, Partlo, W N

Journal:

Journal of Physics D Applied Physics

Year:

2004

Language:

english

File:

PDF, 1024 KB

english, 2004

5

Structural and optical properties of hydrogenated amorphous silicon carbide films by helicon wave plasma-enhanced chemical vapour deposition

Yu, Wei, Lu, Wanbing, Han, Li, Fu, Guangsheng

Journal:

Journal of Physics D Applied Physics

Year:

2004

Language:

english

File:

PDF, 184 KB

english, 2004

6

On the electro-optic measurements in organic single-crystal films

Bhowmik, Achintya K, Tan, Shida, Ahyi, A Claude

Journal:

Journal of Physics D Applied Physics

Year:

2004

Language:

english

File:

PDF, 287 KB

english, 2004

7

Generation of continuously tunable, 5–12 µm radiation by difference frequency mixing of output waves of a KTP optical parametric oscillator in a ZnGeP 2 crystal

Haidar, S, Miyamoto, K, Ito, H

Journal:

Journal of Physics D Applied Physics

Year:

2004

Language:

english

File:

PDF, 205 KB

english, 2004

8

Pinch plasma EUV source with particle injection

McGeoch, Malcolm W

Journal:

Journal of Physics D Applied Physics

Year:

2004

Language:

english

File:

PDF, 377 KB

english, 2004

9

A comparison of three radiation models for the calculation of nozzle arcs

Dixon, C M, Yan, J D, Fang, M T C

Journal:

Journal of Physics D Applied Physics

Year:

2004

Language:

english

File:

PDF, 883 KB

english, 2004

10

Chemical properties and GMR improvement of specular spin valves with nano-oxide layers, formed in ambient mixed gases

Quang, H D, Hien, N T, Oh, S K, Sinh, N H, Yu, S C

Journal:

Journal of Physics D Applied Physics

Year:

2004

Language:

english

File:

PDF, 457 KB

english, 2004

11

EUV sources using Xe and Sn discharge plasmas

Borisov, Vladimir M, Eltsov, Aleksander V, Ivanov, Aleksander S, Kiryukhin, Yuriy B, Khristoforov, Oleg B, Mishchenko, Valentin A, Prokofiev, Aleksander V, Vinokhodov, Aleksander Yu, Vodchits, Vladimi

Journal:

Journal of Physics D Applied Physics

Year:

2004

Language:

english

File:

PDF, 1.57 MB

english, 2004

12

Liquid-jet laser–plasma extreme ultraviolet sources: from droplets to filaments

Hansson, Björn A M, Hertz, Hans M

Journal:

Journal of Physics D Applied Physics

Year:

2004

Language:

english

File:

PDF, 793 KB

english, 2004

13

Relation between the size of fog droplets and their contact angles with CR39 surfaces

Grosu, G, Andrzejewski, L, Veilleux, G, Ross, G G

Journal:

Journal of Physics D Applied Physics

Year:

2004

Language:

english

File:

PDF, 346 KB

english, 2004

14

Plasma sources for EUV lithography exposure tools

Banine, Vadim, Moors, Roel

Journal:

Journal of Physics D Applied Physics

Year:

2004

Language:

english

File:

PDF, 1.07 MB

english, 2004

15

Synthesis of tin-doped indium oxide nanowires by self-catalytic VLS growth

Chen, Y Q, Jiang, J, Wang, B, Hou, J G

Journal:

Journal of Physics D Applied Physics

Year:

2004

Language:

english

File:

PDF, 363 KB

english, 2004

16

UTA versus line emission for EUVL: studies on xenon emission at the NIST EBIT

Fahy, K, Dunne, P, McKinney, L, O'Sullivan, G, Sokell, E, White, J, Aguilar, A, Pomeroy, J M, Tan, J N, Blagojević, B, LeBigot, E-O, Gillaspy, J D

Journal:

Journal of Physics D Applied Physics

Year:

2004

Language:

english

File:

PDF, 300 KB

english, 2004

17

Optimal determination of the elastic constants of woven 2D SiC/SiC composite materials

Mouchtachi, A, Guerjouma, R El, Baboux, J C, Rouby, D, Bouami, D

Journal:

Journal of Physics D Applied Physics

Year:

2004

Language:

english

File:

PDF, 377 KB

english, 2004

18

Cathodoluminscent properties of pulsed laser deposited Er,Yb co-doped Y 2 O 3 thin films

Dikovska, A Og, Okato, T, Atanasov, P A, Obara, M

Journal:

Journal of Physics D Applied Physics

Year:

2004

Language:

english

File:

PDF, 94 KB

english, 2004

19

Fundamentals and limits for the EUV emission of pinch plasma sources for EUV lithography

Krücken, Thomas, Bergmann, Klaus, Juschkin, Larissa, Lebert, Rainer

Journal:

Journal of Physics D Applied Physics

Year:

2004

Language:

english

File:

PDF, 345 KB

english, 2004