Feedback Control System of Wafer Temperature for Advanced...

IEEE Transactions on Semiconductor Manufacturing 2015 / 11 Vol. 28; Iss. 4

Feedback Control System of Wafer Temperature for Advanced Plasma Processing and its Application to Organic Film Etching

Tsutsumi, Takayoshi, Fukunaga, Yusuke, Ishikawa, Kenji, Takeda, Keigo, Kondo, Hiroki, Ohta, Takayuki, Ito, Masafumi, Sekine, Makoto, Hori, Masaru
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Volume:
28
Language:
english
Journal:
IEEE Transactions on Semiconductor Manufacturing
DOI:
10.1109/TSM.2015.2470554
Date:
November, 2015
File:
PDF, 1.28 MB
english, 2015
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