Growth of relaxed Si1−xGex layers using an oxygen doped Si(O) compliant layer
E Haq, W.-X Ni, G.V HanssonVolume:
89
Year:
2002
Language:
english
Pages:
5
DOI:
10.1016/s0921-5107(01)00766-8
File:
PDF, 237 KB
english, 2002