Low energy plasma enhanced chemical vapor deposition
M Kummer, C Rosenblad, A Dommann, T Hackbarth, G Höck, M Zeuner, E Müller, H von KänelVolume:
89
Year:
2002
Language:
english
Pages:
8
DOI:
10.1016/s0921-5107(01)00801-7
File:
PDF, 518 KB
english, 2002