Super self-aligned technology of ultra-shallow junction in...

Materials Science and Engineering: B 2002 Vol. 89; Iss. 1-3

Super self-aligned technology of ultra-shallow junction in MOSFETs using selective Si1−xGex CVD

Tadayoshi Yamashiro, Toshifumi Kikuchi, Makoto Ishii, Fumitaka Honma, Masao Sakuraba, Takashi Matsuura, Junichi Murota, Toshiaki Tsuchiya
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Volume:
89
Year:
2002
Language:
english
Pages:
5
DOI:
10.1016/s0921-5107(01)00814-5
File:
PDF, 285 KB
english, 2002
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