Ellipsometry as a powerful tool for the control of epitaxial semiconductor structures in-situ and ex-situ
K.K. Svitashev, V.A. Shvets, A.S. Mardezhov, S.A. Dvoretsky, Yu.G. Sidorov, N.N. Mikhailov, E.V. Spesivtsev, S.V. RychlitskyVolume:
44
Year:
1997
Language:
english
Pages:
4
DOI:
10.1016/s0921-5107(96)01741-2
File:
PDF, 404 KB
english, 1997