Effects of inductively coupled plasma conditions on the...

Materials Science and Engineering: B 1997 Vol. 50; Iss. 1-3

Effects of inductively coupled plasma conditions on the etch properties of GaN and ohmic contact formations

Hyeon-Soo Kim, Yong-Hyuk Lee, Geun-Young Yeom, Jae-Won Lee, Tae-Il Kim
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Volume:
50
Year:
1997
Language:
english
Pages:
6
DOI:
10.1016/s0921-5107(97)00173-6
File:
PDF, 263 KB
english, 1997
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