Highly textured hexagonal AlN films deposited at low...

Materials Science and Engineering: B 1999 Vol. 59; Iss. 1-3

Highly textured hexagonal AlN films deposited at low temperature by reactive cathodic sputerring

F. Brunet, F. Randriamora, A. Deneuville, P. Germi, B. Anterion, M. Pernet
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Volume:
59
Year:
1999
Language:
english
Pages:
6
DOI:
10.1016/s0921-5107(98)00345-6
File:
PDF, 128 KB
english, 1999
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