The influence of MOCVD process scheme on the optical...

Materials Science and Engineering: B 1999 Vol. 59; Iss. 1-3

The influence of MOCVD process scheme on the optical properties of GaN layers

M Ciorga, L Bryja, J Misiewicz, R Paszkiewicz, R Korbutowicz, M Panek, B Paszkiewicz, M Tłaczała
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Volume:
59
Year:
1999
Language:
english
Pages:
4
DOI:
10.1016/s0921-5107(98)00405-x
File:
PDF, 97 KB
english, 1999
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