A comparative Raman spectroscopy study on silicon surface...

Materials Science and Engineering: B 2000 Vol. 72; Iss. 2-3

A comparative Raman spectroscopy study on silicon surface in HF, HF/H2O2 and HF/NH4F aqueous solutions

Jing Wang, Hailing Tu, Wuxin Zhu, Qigang Zhou, Ansheng Liu, Chun Zhang
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Volume:
72
Year:
2000
Language:
english
Pages:
4
DOI:
10.1016/s0921-5107(99)00512-7
File:
PDF, 126 KB
english, 2000
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