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Highly phosphorus-doped polysilicon films with low tensile stress for surface micromachining using POCl3 diffusion doping
L. Elbrecht, R. Catanescu, J. Zacheja, J. BinderVolume:
61
Year:
1997
Language:
english
Pages:
5
DOI:
10.1016/s0924-4247(97)80292-0
File:
PDF, 655 KB
english, 1997