Ellipsometric, XPS and FTIR study on SiCN films deposited...

Materials Science in Semiconductor Processing 2016 / 02 Vol. 42

Ellipsometric, XPS and FTIR study on SiCN films deposited by hot-wire chemical vapor deposition method

Rahman, Md. Momtazur, Hasan, Syed Kamrul
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Volume:
42
Language:
english
Journal:
Materials Science in Semiconductor Processing
DOI:
10.1016/j.mssp.2015.11.006
Date:
February, 2016
File:
PDF, 724 KB
english, 2016
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