UV–ozone precleaning and forming gas annealing applied to...

Materials Science in Semiconductor Processing 1999 Vol. 2; Iss. 1

UV–ozone precleaning and forming gas annealing applied to wet thermal oxidation of p-type silicon carbide

Carl-Mikael Zetterling, Mikael Östling, Chris I Harris, Peter C Wood, S.Simon Wong
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Volume:
2
Year:
1999
Language:
english
Pages:
5
DOI:
10.1016/s1369-8001(98)00048-1
File:
PDF, 121 KB
english, 1999
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