Atomic transport properties and electrical activation of ultra-low energy implanted boron in crystalline silicon
V Privitera, E Napolitani, F Priolo, S Moffatt, A La Magna, G Mannino, A Carnera, A PicarielloVolume:
2
Year:
1999
Language:
english
Pages:
10
DOI:
10.1016/s1369-8001(99)00004-9
File:
PDF, 368 KB
english, 1999