Electrical characterization of NiSi/Si interfaces formed by...

Semiconductor Science and Technology 2005 / 08 Vol. 20; Iss. 8

Electrical characterization of NiSi/Si interfaces formed by a single and a two-step rapid thermal silicidation

Jiang, Yu-Long, Ru, Guo-Ping, Huang, Wei, Qu, Xin-Ping, Li, Bing-Zong, Agarwal, Aditya, Cai, Gary, Poate, John, Detavernier, Christophe, Meirhaeghe, R L Van
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Volume:
20
Language:
english
Journal:
Semiconductor Science and Technology
DOI:
10.1088/0268-1242/20/8/011
Date:
August, 2005
File:
PDF, 294 KB
english, 2005
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