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In Situ ESD Protection Structure for Variable Operating Voltage Interface Applications in 28-nm CMOS Process
Luo, Sirui, Salcedo, Javier A., Parthasarathy, Srivatsan, Zhou, Yuanzhong, Hajjar, Jean-Jacques, Liou, Juin J.Volume:
14
Language:
english
Journal:
IEEE Transactions on Device and Materials Reliability
DOI:
10.1109/tdmr.2014.2364719
Date:
December, 2014
File:
PDF, 1.46 MB
english, 2014