Charge retention analysis of Si implanted and wet oxidized...

Microelectronic Engineering 2016 / 06 Vol. 159

Charge retention analysis of Si implanted and wet oxidized SONOS structures

Bolomyti, E., Glezos, N., Dimitrakis, P., Normand, P., Benassayg, G., Ioannou-Sougleridis, V.
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Volume:
159
Language:
english
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2016.02.038
Date:
June, 2016
File:
PDF, 1.26 MB
english, 2016
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