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Heat stress exposing performance of deep-nano HK/MG nMOSFETs using DPN or PDA treatment
Wang, Shea-Jue, Wang, Mu-Chun, Chen, Shuang-Yuan, Lan, Wen-How, Yang, Bor-Wen, Huang, L.S., Liu, Chuan-HsiVolume:
55
Language:
english
Journal:
Microelectronics Reliability
DOI:
10.1016/j.microrel.2015.05.016
Date:
November, 2015
File:
PDF, 1.12 MB
english, 2015