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A negative resist, LMR (low molecular weight resist), for deep UV lithography
Toshio Itoh, Yoshio Yamashita, Ryuji Kawazu, Kazutami Kawamura, Seigo Ohno, Takateru Asano, Kenji Kobayashi, Gentaro NagamatsuVolume:
26
Year:
1986
Language:
english
Pages:
7
DOI:
10.1002/pen.760261606
File:
PDF, 1.18 MB
english, 1986